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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Autor
Guilei Wang

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Verlag
Springer Singapore
ISBN/EAN
978-981-15-0046-6
Preis
96,29 EUR
Status
lieferbar