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CMOS Plasma and Process Damage

Autor
Kirk Prall

CMOS Plasma and Process Damage

Beschreibung

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems. 

Verlag
Springer International Publishing
ISBN/EAN
978-3-031-89029-1
Preis
128,39 EUR
Status
nicht lieferbar